Edmund Y. Lam  —  Publications

All keywords:

| AI and deep learning | biomedical microscopy | compressed sensing | computational imaging | computational lithography | digital holography | education technology | electronic imaging | eye imaging | lensless imaging | light field | machine vision and automation | magnetic resonance imaging | metasurface | microplastics | neuromorphic imaging | optical coherence tomography | speckle | super-resolution |

Current keyword: computational lithography

Academic Journals:

1. Xiaofei Wu, Shiyuan Liu, Wen Lv, and Edmund Y. Lam, “Sparse nonlinear inverse imaging for shot count reduction in inverse lithography,” Optics Express, vol. 23, no. 21, pp. 26919–26931, October 2015.
   DOI: 10.1364/OE.23.026919

2. Wen Lv, Shiyuan Liu, Xiaofei Wu, and Edmund Y. Lam, “Illumination source optimization in optical lithography via derivative-free optimization,” Journal of the Optical Society of America A, vol. 31, no. 12, pp. B19–B26, December 2014.
   DOI: 10.1364/JOSAA.31.000B19
   Top Downloads in the Journal of the Optical Society of America A (Dec 14)

3. Xiaofei Wu, Shiyuan Liu, Wen Lv, and Edmund Y. Lam, “Robust and efficient inverse mask synthesis with basis function representation,” Journal of the Optical Society of America A, vol. 31, no. 12, pp. B1–B9, December 2014.
   DOI: 10.1364/JOSAA.31.0000B1

4. Wen Lv, Edmund Y. Lam, Haiqing Wei, and Shiyuan Liu, “Cascadic multigrid algorithm for robust inverse mask synthesis in optical lithography,” Journal of Micro/Nanolithography, MEMS, and MOEMS, vol. 13, no. 2, pp. 023003(1–10), April 2014.
   DOI: 10.1117/1.JMM.13.2.023003

5. Jia Li and Edmund Y. Lam, “Robust source and mask optimization compensating for mask topography effects in computational lithography,” Optics Express, vol. 22, no. 8, pp. 9471–9485, April 2014.
   DOI: 10.1364/OE.22.009471

6. Xiaofei Wu, Shiyuan Liu, Jia Li, and Edmund Y. Lam, “Efficient source mask optimization with Zernike polynomial functions for source representation,” Optics Express, vol. 22, no. 4, pp. 3924–3937, February 2014.
   DOI: 10.1364/OE.22.003924

7. Wen Lv, Shiyuan Liu, Qi Xia, Xiaofei Wu, Yijiang Shen, and Edmund Y. Lam, “Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal time step,” Journal of Vacuum Science and Technology B, vol. 31, no. 4, pp. 041605(1–13), July 2013.
   DOI: 10.1116/1.4813781

8. Jia Li, Shiyuan Liu, and Edmund Y. Lam, “Efficient source and mask optimization with augmented Lagrangian methods in optical lithography,” Optics Express, vol. 21, no. 7, pp. 8076–8090, April 2013.
   DOI: 10.1364/OE.21.008076

9. Jia Li, Yijiang Shen, and Edmund Y. Lam, “Hotspot-aware fast source and mask optimization,” Optics Express, vol. 20, no. 19, pp. 21792–21804, September 2012.
   DOI: 10.1364/OE.20.021792

10. Siu Kai Choy, Ningning Jia, Chong Sze Tong, Man Lai Tang, and Edmund Y. Lam, “A robust computational algorithm for inverse photomask synthesis in optical projection lithography,” SIAM Journal on Imaging Sciences, vol. 5, no. 2, pp. 625–651, May 2012.
    DOI: 10.1137/110830356

11. Ningning Jia and Edmund Y. Lam, “Pixelated source mask optimization for process robustness in optical lithography,” Optics Express, vol. 19, no. 20, pp. 19384–19398, September 2011.
    DOI: 10.1364/OE.19.019384

12. Yijiang Shen, Ningning Jia, Ngai Wong, and Edmund Y. Lam, “Robust level-set-based inverse lithography,” Optics Express, vol. 19, no. 6, pp. 5511–5521, March 2011.
    DOI: 10.1364/OE.19.005511
    News coverage at Laser Focus World

13. Edmund Y. Lam and Alfred K. Wong, “Nebulous hotspot and algorithm variability in computation lithography,” Journal of Micro/Nanolithography, MEMS, and MOEMS, vol. 9, no. 3, pp. 033002(1–9), July 2010.
    DOI: 10.1117/1.3459937

14. Ningning Jia and Edmund Y. Lam, “Machine learning for inverse lithography: Using stochastic gradient descent for robust photomask synthesis,” Journal of Optics, vol. 12, no. 4, pp. 045601(1–9), April 2010.
    DOI: 10.1088/2040-8978/12/4/045601

15. Yijiang Shen, Ngai Wong, and Edmund Y. Lam, “Level-set-based inverse lithography for photomask synthesis,” Optics Express, vol. 17, no. 26, pp. 23690–23701, December 2009.
    DOI: 10.1364/OE.17.023690

16. Edmund Y. Lam and Alfred K.K. Wong, “Computation lithography: virtual reality and virtual virtuality,” Optics Express, vol. 17, no. 15, pp. 12259–12268, July 2009.
    DOI: 10.1364/OE.17.012259

17. Stanley H. Chan, Alfred K. Wong, and Edmund Y. Lam, “Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography,” Optics Express, vol. 16, no. 19, pp. 14746–14760, September 2008.
    DOI: 10.1364/OE.16.014746

18. Giuseppe Y. Mak, Alfred K. Wong, and Edmund Y. Lam, “Optimization of photomask design for reducing aberration-induced placement error,” IEEE Transactions on Semiconductor Manufacturing, vol. 19, no. 3, pp. 277–285, August 2006.
    DOI: 10.1109/TSM.2006.879412

19. Jun Wang, Alfred K. Wong, and Edmund Y. Lam, “Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates,” Journal of Microlithography, Microfabrication and Microsystems, vol. 4, no. 1, pp. 013001(1–10), January 2005.
    DOI: 10.1117/1.1857529

20. Giuseppe Y. Mak, Alfred K. Wong, and Edmund Y. Lam, “Alternating phase-shifting mask design for low aberration sensitivity,” Journal of Microlithography, Microfabrication and Microsystems, vol. 4, no. 1, pp. 013008(1–8), January 2005.
    DOI: 10.1117/1.1861732

21. Jun Wang, Alfred K. Wong, and Edmund Y. Lam, “Standard cell layout with regular contact placement,” IEEE Transactions on Semiconductor Manufacturing, vol. 17, no. 3, pp. 375–383, August 2004.
    DOI: 10.1109/TSM.2004.831522

Conference Proceedings:

1. Xiaofei Wu, Tim Füehner, Andreas Erdmann, and Edmund Y. Lam, “Level-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model,” in OSA Topical Meeting in Computational Optical Sensing and Imaging, pp. CW1B.4, June 2017.
   DOI: 10.1364/COSI.2017.CW1B.4

2. Xiaofei Wu, Andreas Erdmann, Tim Füehner, and Edmund Y. Lam, “Evaluation of photomask shape uncertainties on level-set-based inverse lithography with a rigorous mask model,” in European Mask and Lithography Conference, June 2016.

3. Edmund Y. Lam and Xiaofei Wu, “Impact of photomask shape uncertainties on computational lithography,” in China Semiconductor Technology International Conference (CSTIC), pp. 1–4, March 2016.
   Invited Paper at the conference

4. Xiaofei Wu, Shiyuan Liu, Andreas Erdmann, and Edmund Y. Lam, “Incorporating photomask shape uncertainty in computational lithography,” in Optical Microlithography, volume 9780 of Proceedings of the SPIE, pp. 97800Q, February 2016.
   DOI: 10.1117/12.2220278

5. Xiaofei Wu, Shiyuan Liu, and Edmund Y. Lam, “Computational techniques to incorporate shot count reduction into inverse lithography,” in China Semiconductor Technology International Conference (CSTIC), pp. 1–3, March 2015.
   DOI: 10.1109/CSTIC.2015.7153342
   SEMI ECS Best Student Paper Award

6. Xiaofei Wu, Wen Lv, Shiyuan Liu, and Edmund Y. Lam, “Application of basis function to robust and efficient lithography optimization,” in Fraunhofer IISB Lithography Simulation Workshop, September 2014.
   Invited Paper at the conference

7. Jia Li and Edmund Y. Lam, “Joint optimization of source, mask, and pupil in optical lithography,” in Optical Microlithography, volume 9052 of Proceedings of the SPIE, pp. 90520S, February 2014.
   DOI: 10.1117/12.2045739

8. Jia Li, Shiyuan Liu, and Edmund Y. Lam, “Efficient source and mask optimization with augmented Lagrangian methods in optical lithography,” in Fraunhofer IISB Lithography Simulation Workshop, September 2013.
   Invited Paper at the conference

9. Edmund Y. Lam, “Computational imaging technology for nanolithography,” in The Japan Society of Applied Physics and The Optical Society Joint Symposia, pp. 17p-D5-10, September 2013.
   DOI: 10.1364/JSAP.2013.17p_D5_10
   Invited Paper at the conference

10. Xiaofei Wu, Shiyuan Liu, Jia Li, and Edmund Y. Lam, “Efficient source mask optimization with Zernike polynomial function-based source representation,” in OSA Meeting on Nanophotonics, Nanoelectronics and Nanosensor, pp. NSa3A.15, May 2013.
    DOI: 10.1364/N3.2013.NSa3A.15

11. Xiaofei Wu, Shiyuan Liu, and Edmund Y. Lam, “Fast aerial image simulation of partially coherent illumination system for source mask optimization,” in OSA Conference on Advances in Optoelectronics and Micro/Nano Optics, pp. 135, May 2013.

12. Jia Li and Edmund Y. Lam, “Efficient mask synthesis with augmented Lagrangian methods in computational lithography,” in China Semiconductor Technology International Conference (CSTIC), March 2013. Published in ECS Transactions, vol. 52, no. 1, pp. 163–168, March 2013.
    DOI: 10.1149/05201.0163ecst
    Invited Paper at the conference

13. Jia Li, Ningning Jia, and Edmund Y. Lam, “Hotspot-aware robust mask design with inverse lithography,” in China Semiconductor Technology International Conference (CSTIC), March 2012. Published in ECS Transactions, vol. 44, no. 1, pp. 197–202, March 2012.
    DOI: 10.1149/1.3694316
    Invited Paper at the conference

14. Ningning Jia and Edmund Y. Lam, “Robustness enhancement in optical lithography: From pixelated mask optimization to pixelated source-mask optimization,” in China Semiconductor Technology International Conference (CSTIC), March 2011. Published in ECS Transactions, vol. 34, no. 1, pp. 203–208, March 2011.
    DOI: 10.1149/1.3567582
    Invited Paper at the conference

15. Ningning Jia and Edmund Y. Lam, “Performance analysis of pixelated source-mask optimization for optical microlithography,” in IEEE International Conference on Electron Devices and Solid-State Circuits, December 2010.
    DOI: 10.1109/EDSSC.2010.5713709

16. Ningning Jia and Edmund Y. Lam, “Stochastic gradient descent for robust inverse photomask synthesis in optical lithography,” in IEEE International Conference on Image Processing, pp. 4173–4176, September 2010.
    DOI: 10.1109/ICIP.2010.5653690

17. Yijiang Shen, Ngai Wong, and Edmund Y. Lam, “Aberration-aware robust mask design with level-set-based inverse lithography,” in Photomask and Next-Generation Lithography Mask Technology, volume 7748 of Proceedings of the SPIE, pp. 77481U, April 2010.
    DOI: 10.1117/12.863973

18. Edmund Y. Lam, “Regularization in inverse lithography: Enhancing manufacturability and robustness to process variations,” in China Semiconductor Technology International Conference (CSTIC), March 2010. Published in ECS Transactions, vol. 27, no. 1, pp. 427–432, March 2010.
    DOI: 10.1149/1.3360655
    Invited Paper at the conference

19. Ningning Jia, Alfred K. Wong, and Edmund Y. Lam, “Regularization of inverse photomask synthesis to enhance manufacturability,” in Lithography Asia, volume 7520 of Proceedings of the SPIE, pp. 75200E, November 2009.
    DOI: 10.1117/12.837512

20. Alfred K.K. Wong and Edmund Y. Lam, “Computation lithography: Virtual reality and virtual virtuality,” in International Semiconductor Technology Conference and China Semiconductor Technology International Conference (ISTC/CSTIC), March 2009. Published in ECS Transactions, vol. 18, no. 1, pp. 351–356, March 2009.
    Keynote Address at the conference

21. Alfred K.K. Wong and Edmund Y. Lam, “The nebulous hotspot and algorithm variability,” in Design for Manufacturability through Design-Process Integration, volume 7275 of Proceedings of the SPIE, pp. 727509, February 2009.
    DOI: 10.1117/12.816449

22. Ningning Jia, Alfred K. Wong, and Edmund Y. Lam, “Robust mask design with defocus variation using inverse synthesis,” in Lithography Asia, volume 7140 of Proceedings of the SPIE, pp. 71401W, November 2008.
    DOI: 10.1117/12.804681
    Best Student Paper Award

23. Stanley H. Chan and Edmund Y. Lam, “Inverse image problem of designing phase shifting masks in optical lithography,” in IEEE International Conference on Image Processing, pp. 1832–1835, October 2008.
    DOI: 10.1109/ICIP.2008.4712134

24. Stanley H. Chan, Alfred K. Wong, and Edmund Y. Lam, “Inverse synthesis of phase-shifting mask for optical lithography,” in OSA Topical Meeting in Signal Recovery and Synthesis, SMD3, June 2007.
    DOI: 10.1364/SRS.2007.SMD3

25. Jun Wang, Alfred K. Wong, and Edmund Y. Lam, “Performance optimization for gridded-layout standard cells,” in Photomask 2004, volume 5567 of Proceedings of the SPIE, pp. 107–118, September 2004.
    DOI: 10.1117/12.569398

26. Jun Wang, Alfred K. Wong, and Edmund Y. Lam, “Standard cell design with regularly-placed contacts and gates,” in Design and Process Integration for Microelectronic Manufacturing II, volume 5379 of Proceedings of the SPIE, pp. 55–66, February 2004.
    DOI: 10.1117/12.534538

27. Giuseppe Y. Mak, Alfred K. Wong, and Edmund Y. Lam, “Alternating phase-shifting mask design for low aberration sensitivity,” in Optical Microlithography XVII, volume 5377 of Proceedings of the SPIE, pp. 591–601, February 2004.
    DOI: 10.1117/12.534686

28. Giuseppe Y.H. Mak, Edmund Y. Lam, and Alfred K. Wong, “Placement sensitivity to aberration in optical imaging,” in 2003 IEEE Conference on Electron Devices and Solid-State Circuits, pp. 475–478, December 2003.
    DOI: 10.1109/EDSSC.2003.1283576